Backside-Illuminated Photoelectrochemical (Bipec) Etching

A novel etching process that utilizes photo-generated holes to permit the electrochemical etching of a material, such as a III-Nitride, under conditions with which it would otherwise not etch. University of California, Santa Barbara Office of Technology & Industry Alliances dobis@tia.ucsb.edu 805-893-2073

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