UIC-2009-122 – Method for Depositing Multi-element Complex Structures by Chemical Vapor Deposition (CVD), Atomic Layer Depositions (ALD), or a Combined Alternating Mode using a Single Deposition System

This invention is a novel method for depositing multi-element complex structures by chemical vapor deposition (CVD), atomic layer deposition (ALD), or a combined alternating mode using a single deposition system. The technology can be easily adapted to add more precursors or oxidizing reagents and can be used in continuous or cyclic modes to deposit simple or multi-metal films, or more complex structures such as multilayered stacks or nano-laminates. Working prototype exists. Jonathan Gortat jgortat@otm.uic.edu (312) 413-1643

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