This invention is a novel method for depositing multi-element complex structures by chemical vapor deposition (CVD), atomic layer deposition (ALD), or a combined alternating mode using a single deposition system. The technology can be easily adapted to add more precursors or oxidizing reagents and can be used in continuous or cyclic modes to deposit simple or multi-metal films, or more complex structures such as multilayered stacks or nano-laminates. Working prototype exists. Jonathan Gortat jgortat@otm.uic.edu (312) 413-1643
Smart, interactive desk
May 8, 2023
No Comments
Get ready to take your space management game to the next level with the University of Glasgow’s innovative project! By combining the